TWI774507B

The present invention addresses the problem regarding particle generation in a Fe-Pt-BN-based sputtering target having a high relative density. This Fe-Pt-BN-based sputtering target is characterized by containing carbon (C) and boron oxide and BN or a non-magnetic component formed of boron oxide and...

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Bibliographische Detailangaben
Hauptverfasser:	NISHIURA, MASAHIRO, KUROSE, KENTA, WATANABE, YASUNOBU, MATSUDA, TOMOKO, KOBAYASHI, HIRONORI, YAMAMOTO, TAKAMICHI
Format:	Patent
Sprache:	chi
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	The present invention addresses the problem regarding particle generation in a Fe-Pt-BN-based sputtering target having a high relative density. This Fe-Pt-BN-based sputtering target is characterized by containing carbon (C) and boron oxide and BN or a non-magnetic component formed of boron oxide and BN, and by having a relative density of 88% or more, and an oxygen content more than 4000 wtppm but not more than 10,000 wtppm, and is characterized in that the ratio of a water soluble boron concentration (wt%) with respect to the total boron concentration (wt%) as determined through a specific procedure is 1.0% or more.