Correction method for irradiation region of electron beam, and electron beam irradiation apparatus

Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adj...

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Bibliographische Detailangaben
Hauptverfasser: YOSHIKAWA, SHOJI, SUEMATSU, KENICHI, WATANABE, KENJI, TSUKAMOTO, KIWAMU, OKADA, SHINICHI, TERAO, KENJI, HATAKEYAMA, MASAHIRO, TAJIMA, RYO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.