TWI762526B
The invention relates to a holder for a mask (1) that rests on the surface to be coated of a substrate (2) during a coating process in order to restrict the deposition of a layer on predetermined areas of the surface by way of the shape and position of the mask (1), portions (4, 4', 4'...
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Format: | Patent |
Sprache: | chi |
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Zusammenfassung: | The invention relates to a holder for a mask (1) that rests on the surface to be coated of a substrate (2) during a coating process in order to restrict the deposition of a layer on predetermined areas of the surface by way of the shape and position of the mask (1), portions (4, 4', 4'', 4''', 16) of a frame (3) of the holder engaging on the edges (1') of the mask (1) with a variable tensile force that deforms the mask (1). The following innovations are provided: a sensor (5) for ascertaining an actual position of the mask (1) in relation to the substrate (2), actuators (6, 7, 8) for modifying the position of at least one first portion (4) of the frame (3) in relation to at least one second portion (4') of the frame (3) and a control loop having a controller (9) for modifying the actual position of the mask (1) in the direction of an intended position of the mask (1) by changing the tensile force (Z, Z', Z'', Z'''). The invention moreover relates to a method for adjusting the position of the mask, in which a |
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