TWI761597B

An imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold includes a mold holder that holds the mold and an optical system that irradiates the imprint material on the substrate with irradiation light for increasing a viscosity of the imprint material. The irradi...

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Bibliographische Detailangaben
Hauptverfasser:	KOBAYASHI, KENICHI, FUNAYOSHI, TOMOMI, HAYASHI, TATSUYA
Format:	Patent
Sprache:	chi
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	An imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold includes a mold holder that holds the mold and an optical system that irradiates the imprint material on the substrate with irradiation light for increasing a viscosity of the imprint material. The irradiation light has a light intensity distribution such that a light intensity increases from a center of a pattern portion of the mold toward a side surface of the pattern portion when the mold is held by the mold holder. The imprint material that moves from the center of the pattern portion of the mold toward the side surface of the pattern portion in a region including the side surface of the pattern portion of the mold is irradiated with the irradiation light while the mold and the imprint material on the substrate are in contact with each other.