TWI761004B

According to one aspect of the present invention, a pattern inspection apparatus includes a uniform sizing processing circuit configured to resize a line width of a design pattern being a basis of the figure pattern by using a uniform sizing amount which has been set in advance; a reference image ge...

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Bibliographische Detailangaben
1. Verfasser:	INOUE, HIROMU
Format:	Patent
Sprache:	chi
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	According to one aspect of the present invention, a pattern inspection apparatus includes a uniform sizing processing circuit configured to resize a line width of a design pattern being a basis of the figure pattern by using a uniform sizing amount which has been set in advance; a reference image generation circuit configured to generate a reference image corresponding to the secondary electron image by performing image development on data of the design pattern whose line width has been resized; and a line-width dependent correction circuit configured to correct a line width of a figure pattern in the secondary electron image by using a correction amount which has been set in advance depending on a line width size.