METHOD AND APPARATUS FOR PELLICLE REMOVAL

A method and apparatus (100) for removing a pellicle (170) from a photomask (156, 174, 210) wherein the adhesive (206) between the pellicle frame (158, 172, 204) and photomask (156, 174, 210) is cooled sufficiently to allow the adhesive property of the adhesive (206) to diminish to the point where t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BOYETTE, JAMES, GRENON, BRIAN J
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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