METHOD AND APPARATUS FOR PELLICLE REMOVAL

A method and apparatus (100) for removing a pellicle (170) from a photomask (156, 174, 210) wherein the adhesive (206) between the pellicle frame (158, 172, 204) and photomask (156, 174, 210) is cooled sufficiently to allow the adhesive property of the adhesive (206) to diminish to the point where t...

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Bibliographische Detailangaben
Hauptverfasser:	BOYETTE, JAMES, GRENON, BRIAN J
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method and apparatus (100) for removing a pellicle (170) from a photomask (156, 174, 210) wherein the adhesive (206) between the pellicle frame (158, 172, 204) and photomask (156, 174, 210) is cooled sufficiently to allow the adhesive property of the adhesive (206) to diminish to the point where the adhesive (206) will release from the photomask (156, 174, 210) with little or no mechanical force and leaving minimal adhesive (206) on the photomask (156, 174, 210). The adhesive (206) is cooled by way of manifolds (176, 178, 180, 182) containing coolant being brought in contact with the pellicle frame (158, 172, 204) or by way of a coolant spray nozzles (202) spraying coolant directly onto the pellicle frame (158, 172, 204).