Coating apparatus, height detecting method and coating method

An objective is to detect the height of an upper side of a substrate with a high degree of precision with respect to a position opposed to a nozzle, in regard to an application apparatus supplying a treatment solution to a substrate while carrying the substrate in a horizontal direction by applying...

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Bibliographische Detailangaben
Hauptverfasser:	OE, MUNEAKI, KUROEDA, ATSUSHI, JITSUI, YUSUKE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	An objective is to detect the height of an upper side of a substrate with a high degree of precision with respect to a position opposed to a nozzle, in regard to an application apparatus supplying a treatment solution to a substrate while carrying the substrate in a horizontal direction by applying buoyancy to the substrate. An application apparatus (1) includes: carrying parts (31, 32, 33) carrying a substrate (S) in a horizontal direction while applying buoyancy to the substrate from bottom; a nozzle (71) positioned on an application position opposed to an upper side of the carried substrate to discharge a treatment solution to the substrate; a height detection part (62) detecting the height of the upper side of the substrate with respect to a detection position (Pa) on the upstream or downstream side of the nozzle in a carrying direction of the substrate; and a calculation part calculating the height of the upper side (Sf) of the substrate with respect to an opposed position (Pb) opposed to the nozzle loca