Method and apparatus for coating substrate

[PROBLEMS TO BE SOLVED] Provided are a method for coating a substrate and an apparatus for coating a substrate, that allows to make a coating film thickness as constant as possible in a period of several seconds from the start of coating when the movement of nozzle and the discharge of the coating l...

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Bibliographische Detailangaben
Hauptverfasser:	XIA, CHENG XIONG, NAGAI, HISAYA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	[PROBLEMS TO BE SOLVED] Provided are a method for coating a substrate and an apparatus for coating a substrate, that allows to make a coating film thickness as constant as possible in a period of several seconds from the start of coating when the movement of nozzle and the discharge of the coating liquid from the nozzle are simultaneously started, and can prevent a use area of the substrate from being reduced. [SOLUTION] When a coating liquid (D) is applied to the substrate (8) by simultaneously discharging the coating liquid and discharging the coating liquid from the nozzle (3) simultaneously with the movement of the nozzle, the moving speed Vt of the nozzle is gradually increased (Vt1, Vt2, Vt3), and the amount of coating liquid per unit area of the substrate is made constant so that the thickness of the coating is constant.