PROCESS FOR REMOVING AN IMPURITY FROM A CHLOROSILANE MIXTURE

PROCESS FOR REMOVING AN IMPURITY FROM A CHLOROSILANE MIXTURE

Boron, phosphorus, arsenic, antimony and other impurities are at least partially removed from a mixture containing at least one chlorosilane and/or organochlorosilane bya) contacting the liquid mixture with a carrier material functionalized with an amidoxime of the general structural formula (I),whe...

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Bibliographische Detailangaben
Hauptverfasser: KNOTH, JENS FELIX, PROST, SEBASTIAN, PAETZOLD, UWE, BOCHMANN, SEBASTIAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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Beschreibung
Zusammenfassung:Boron, phosphorus, arsenic, antimony and other impurities are at least partially removed from a mixture containing at least one chlorosilane and/or organochlorosilane bya) contacting the liquid mixture with a carrier material functionalized with an amidoxime of the general structural formula (I),whereCAR=carrier material and R1, R2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl; andb) optionally removing the functionalized carrier material.