Method and system for charged particle microscopy with improved image beam stabilization and interrogation

A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system...

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Bibliographische Detailangaben
Hauptverfasser:	CHEN, GRACE HSIU-LING, MASNAGHETTI, DOUGLAS K, KNIPPELMEYER, RAINER, TREASE, DAVID, TOTH, GABOR, BOTHRA, ROHIT
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS TESTING
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Beschreibung
Zusammenfassung:	A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.