Tuning patterning apparatus based on optical characteristic

Described herein is a method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target a...

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Bibliographische Detailangaben
Hauptverfasser:	HEPP, BIRGITT NOELLE CORNELIA LIDUINE, BASELMANS, JOHANNES JACOBUS MATHEUS, KOHLER, CARSTEN ANDREAS, KOLLER, PAULUS HUBERTUS PETRUS, BOUMA, ANITA, SMEETS, BART
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Described herein is a method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting optical parameters associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.