Substrate processing apparatus and substrate processing method
A mounting unit (40) of this substrate treatment device is provided with a substrate support part (411) and a measurement part (413). The substrate support part (411) supports a substrate (9) in a horizontal state. The measurement part (413) measures an edge position that is the position in a horizo...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A mounting unit (40) of this substrate treatment device is provided with a substrate support part (411) and a measurement part (413). The substrate support part (411) supports a substrate (9) in a horizontal state. The measurement part (413) measures an edge position that is the position in a horizontal direction of a peripheral edge of the substrate (9) supported by the substrate support part (411). A center robot receives the substrate (9) supported by the substrate support part (411) of the mounting unit (40), and carries the substrate into a treatment unit. A computing part of a controller finds a center position of the substrate (9) on the basis of the edge position measured by the measurement part (413). Before a hand of the center robot receives the substrate (9) from the substrate support part (411), a transfer robot controller adjusts the position of the hand in the mounting unit (40) on the basis of the center position of the substrate (9). Consequently, the positional accuracy of the substrate (9) |
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