Illumination optical unit for a projection exposure system

An illumination optical unit (17i) for a projection exposure system (1) comprises a plurality of radiation-reflecting components, wherein all of the radiation-reflecting components are arranged in such a way that a beam (10i) with illumination radiation (5) is deflected at these in the same sense.

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Bibliographische Detailangaben
Hauptverfasser:	BIELING, STIG, PATRA, MICHAEL
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An illumination optical unit (17i) for a projection exposure system (1) comprises a plurality of radiation-reflecting components, wherein all of the radiation-reflecting components are arranged in such a way that a beam (10i) with illumination radiation (5) is deflected at these in the same sense.