TWI735604B
Provided is a silylation agent solution ensuring reduced flammability without affecting water repellency or hydrophobicity. Moreover, provided are a surface treatment method using the silylation agent solution, and a method for producing a semiconductor device. To this end, the silylation agent solu...
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Format: | Patent |
Sprache: | chi |
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Zusammenfassung: | Provided is a silylation agent solution ensuring reduced flammability without affecting water repellency or hydrophobicity. Moreover, provided are a surface treatment method using the silylation agent solution, and a method for producing a semiconductor device. To this end, the silylation agent solution contains a silylation agent and a solvent which has flammability greater than or equal to 50 DEG C and is at least one selected from the group composed of glycolalkyl ether, a hydrocarbon-based solvent, and straight chain-type or branched chain-type carboxylic acid ester. |
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