TWI735604B

Provided is a silylation agent solution ensuring reduced flammability without affecting water repellency or hydrophobicity. Moreover, provided are a surface treatment method using the silylation agent solution, and a method for producing a semiconductor device. To this end, the silylation agent solu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MORI, DAIJIRO, KUMAZAWA, AKIRA
Format: Patent
Sprache:chi
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Provided is a silylation agent solution ensuring reduced flammability without affecting water repellency or hydrophobicity. Moreover, provided are a surface treatment method using the silylation agent solution, and a method for producing a semiconductor device. To this end, the silylation agent solution contains a silylation agent and a solvent which has flammability greater than or equal to 50 DEG C and is at least one selected from the group composed of glycolalkyl ether, a hydrocarbon-based solvent, and straight chain-type or branched chain-type carboxylic acid ester.