Heating apparatus for substrate, heating method for substrate and infrared heaters

Balance of a temperature distribution of an infrared heater is improved. According to an embodiment, a substrate heating device comprises: a pressure reducing unit for reducing pressure of the atmosphere of an accommodating space of a substrate onto which a solution is applied; and an infrared heate...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAYA, KENICHI, MASU, YOSHIAKI, KATO, SHIGERU, SAHODA, TSUTOMU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Balance of a temperature distribution of an infrared heater is improved. According to an embodiment, a substrate heating device comprises: a pressure reducing unit for reducing pressure of the atmosphere of an accommodating space of a substrate onto which a solution is applied; and an infrared heater capable of heating the substrate by an infrared ray. The infrared heater comprises: a bending unit bent to form tubular shapes at multiple points and be outwardly convex; and a cover unit disposed to cover at least a portion of the bending unit from the outside.