Release film having excellent peelability

The present invention provides a release film with excellent peelability, which has small peel strength, of which the peel strength is difficult to increase even when time elapses in a state of being attached to an adhesive layer, and which does not lower adhesion of the attached adhesive layer since transition of a silicon component to the adhesive layer is low. In addition, the provided release film has a low quantity of charge when being handled, and peeled from an adherend. The release film (5) having, on at least one side surface of a base film (1), a two-layered release agent layer in which a first release agent layer (2) including an antistatic agent but not including particles, and a second release agent layer (4) including particles (3) are stacked in order. The total thickness of the first release agent layer (2) and the second release layer (4) is 0.4-2.0 μm; the protrusion height from the surface of the second release agent layer (4) to the peak of the particle (3) is greater than the above total