TWI696597B

Disclosed are a sintered body, a sputtering target, and a method for manufacturing a sintered body, which are capable of suppressing the occurrence of abnormal discharge by effectively reducing the bulk resistance while having an appropriate mechanical strength. The sintered body of the present inve...

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Bibliographische Detailangaben
Hauptverfasser:	HIDESHIMA, MASAAKI, KAKUTA, KOJI
Format:	Patent
Sprache:	chi
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	Disclosed are a sintered body, a sputtering target, and a method for manufacturing a sintered body, which are capable of suppressing the occurrence of abnormal discharge by effectively reducing the bulk resistance while having an appropriate mechanical strength. The sintered body of the present invention is an oxide sintered body containing In, Ga and Zn, wherein the relationship of 0.317 < In / (In + Ga + Zn) ≤ 0.350, 0.317 < Ga / (In + Ga + Zn) ≤ 0.350 and 0.317 < Zn / (In + Ga + Zn) ≤ 0.350 is satisfied, the bulk resistance value is 15 m[Omega]cm or more and 25 m[Omega]cm or less, and the bending strength is 40 MPa or more and less than 50 MPa.