Method and apparatus for correcting substrate deformity

Embodiments of methods and apparatus for correcting substrate deformity are provided herein. In some embodiments, a substrate support includes a base having an interior volume formed by walls extending upward from the base; a plurality of infrared lamps disposed within the interior volume; a support...

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Hauptverfasser: ELUMALAI, KARTHIK, PEH, ENG SHENG, RAJAPAKSA, DIMANTHA, SU, JUN-LIANG, VAYYAPRON, SHOJU, THIRUNAVUKARASU, SRISKANTHARAJAH, TATTI, ARUNKUMAR M
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Embodiments of methods and apparatus for correcting substrate deformity are provided herein. In some embodiments, a substrate support includes a base having an interior volume formed by walls extending upward from the base; a plurality of infrared lamps disposed within the interior volume; a support plate disposed above the plurality of infrared lamps, wherein the support plate includes a support surface to support a substrate; and a cover plate disposed atop the support plate and having a central opening corresponding to the support surface and an exhaust portion at a periphery of a top surface of the cover plate, wherein the exhaust portion includes a plurality of perforations fluidly coupling a space above the cover plate with an exhaust conduit formed in the cover plate. Embodiments of a showerhead assembly and processing equipment incorporating the inventive substrate support and showerhead assembly are additionally provided herein.