Electron beam inspection apparatus stage positioning

An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the ele...

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Hauptverfasser: BAGGEN, MARCEL KOENRAAD MARIE, HEMPENIUS, PETER PAUL, VAN DE RIJDT, JOHANNES HUBERTUS ANTONIUS, BOSCH, NIELS JOHANNES MARIA, VAN DE GROES, HENRICUS MARTINUS JOHANNES, ARENDS, ANTONIUS HENRICUS, BUTLER, HANS, KUINDERSMA, LUCAS, VAN KEMPEN, ROBERTUS JACOBUS THEODORUS, TSENG, KUO FENG, RONDE, MICHAEL JOHANNES CHRISTIAAN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.