A lithography apparatus and a method of manufacturing a device

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of...

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Bibliographische Detailangaben
Hauptverfasser:	MELMAN, JOHANNES CORNELIS PAULUS, VIEYRA SALAS, JORGE ALBERTO, BOMBEECK, JOHN MARIA, LEMPENS, HAN HENRICUS ALDEGONDA, GATTOBIGIO, GIOVANNI LUCA, CUYPERS, KOEN, POLET, THEODORUS WILHELMUS, EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA, DEBOUGNOUX, FRANK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.