Radiation-sensitive resin composition, infrared shielding film and forming method thereof, solid-state imaging device,? and illumination sensor

According to the present invention, a radiation sensitive resin composition can be used to form a film having high capability of blocking infrared rays. The infrared ray blocking film can be used to a solid state imaging device and a luminance sensor. The radiation sensitive resin composition compri...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ICHINOHE, DAIGO, HATAKEYAMA, KOUJI, YANAGI, TAKANORI, KAWAI, TAKAHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	According to the present invention, a radiation sensitive resin composition can be used to form a film having high capability of blocking infrared rays. The infrared ray blocking film can be used to a solid state imaging device and a luminance sensor. The radiation sensitive resin composition comprises: [A] a polymer; [B] a quinone diazide compound; and [C] an infrared ray blocking material.