TWI676696B

A cylindrical sputtering target according to the present invention comprises: a metallic cylindrical substrate; and a ceramic cylindrical target material joined to an outer peripheral side of the cylindrical substrate and integrally formed so as to have a length of 750 mm or more in an axial directi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TSURUTA, YOSHITAKA, NEGISHI, TOMOYA
Format: Patent
Sprache:chi
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Beschreibung
Zusammenfassung:A cylindrical sputtering target according to the present invention comprises: a metallic cylindrical substrate; and a ceramic cylindrical target material joined to an outer peripheral side of the cylindrical substrate and integrally formed so as to have a length of 750 mm or more in an axial direction, wherein a variation coefficient of a bulk resistivity in an axial direction is 0.05 or less on the outer peripheral surface of the cylindrical target material.