Managing method and apparatus for developing solution

A developing solution managing method and apparatus are provided and can achieve developing treatment with maintainable expected developing performance, maintainable expected line width and maintainable expected residual film thickness. The developing solution managing apparatus (D) is provided with...

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Bibliographische Detailangaben
1. Verfasser: NAKAGAWA, TOSHIMOTO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A developing solution managing method and apparatus are provided and can achieve developing treatment with maintainable expected developing performance, maintainable expected line width and maintainable expected residual film thickness. The developing solution managing apparatus (D) is provided with a control unit (21). The control unit is provided with a data memory part (23) memorizing electric conductivity data provided with electric conductivity values of a developing solution each concentration zone of which adopting as indexes the concentration of a dissolved photoresist and the concentration of absorbed carbon dioxide of an alkaline and repeatedly used developing solution is confirmed in advance to achieve preset developing performance, and a control part (31) setting an electric conductivity value, memorized in the data memory part (23), of a concentration zone having a determined concentration of absorbed carbon dioxide and a determined concentration of the dissolved photoresist in the developing sol