Systems and methods for vapor delivery

A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a fi...

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Hauptverfasser: DUVALL, ANDREW KENICHI, LAVOIE, ADRIEN, KANG, HU, BALDASSERONI, CHLOE, SABRI, MOHAMED, PASQUALE, FRANK, LEESER, KARL, SMITH, DAVID, KUMAR, PURUSHOTTAM, HA, JEONGSEOK, QIAN, JUN, BALDWIN, JEREMIAH, CHANDRASEKHARAN, RAMESH, RANGANATHAN, EASHWAR, SWAMINATHAN, SHANKAR, LANDIS, HEATHER, BAE, INGI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node.