Polymer, organic layer composition, and method of forming patterns
The present invention provides a polymer comprising a structure unit represented by chemical formula 1 below and a structure unit represented by chemical formula 2 below, an organic layer composition comprising the polymer, and a method for forming patterns using the organic layer composition. In th...
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| creator | RATHWELL, DOMINEA KWON, HYO YOUNG JUNG, HYEONIL HEO, YUMI NAMGUNG, RAN MUN, SOOHYOUN SONG, HYUNJI NAM, YOUNHEE |
| description | The present invention provides a polymer comprising a structure unit represented by chemical formula 1 below and a structure unit represented by chemical formula 2 below, an organic layer composition comprising the polymer, and a method for forming patterns using the organic layer composition. In the chemical formula 1 and 2, A1 and A2 are each independently a divalent group comprising at least one substituted or unsubstituted benzene ring, A3 is a divalent group each containing a quaternary carbon and a ring, symbol * is a point of connection. |
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In the chemical formula 1 and 2, A1 and A2 are each independently a divalent group comprising at least one substituted or unsubstituted benzene ring, A3 is a divalent group each containing a quaternary carbon and a ring, symbol * is a point of connection.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEOwjAMAMAsDAj4gx9QJqDdg0CwMVRirKzUKZESO3K89PcsPIDplts6_5K8FtIORBfkFCDjSgpBSpWWLAl3gDxDIfvIDBIhipbEC1Q0I-W2d5uIudHh587B_TZeH0eqMlGrGIjJpvH97Pvhch68P_1RvuhxMjk</recordid><startdate>20190801</startdate><enddate>20190801</enddate><creator>RATHWELL, DOMINEA</creator><creator>KWON, HYO YOUNG</creator><creator>JUNG, HYEONIL</creator><creator>HEO, YUMI</creator><creator>NAMGUNG, RAN</creator><creator>MUN, SOOHYOUN</creator><creator>SONG, HYUNJI</creator><creator>NAM, YOUNHEE</creator><scope>EVB</scope></search><sort><creationdate>20190801</creationdate><title>Polymer, organic layer composition, and method of forming patterns</title><author>RATHWELL, DOMINEA ; KWON, HYO YOUNG ; JUNG, HYEONIL ; HEO, YUMI ; NAMGUNG, RAN ; MUN, SOOHYOUN ; SONG, HYUNJI ; NAM, YOUNHEE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI667547BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>RATHWELL, DOMINEA</creatorcontrib><creatorcontrib>KWON, HYO YOUNG</creatorcontrib><creatorcontrib>JUNG, HYEONIL</creatorcontrib><creatorcontrib>HEO, YUMI</creatorcontrib><creatorcontrib>NAMGUNG, RAN</creatorcontrib><creatorcontrib>MUN, SOOHYOUN</creatorcontrib><creatorcontrib>SONG, HYUNJI</creatorcontrib><creatorcontrib>NAM, YOUNHEE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RATHWELL, DOMINEA</au><au>KWON, HYO YOUNG</au><au>JUNG, HYEONIL</au><au>HEO, YUMI</au><au>NAMGUNG, RAN</au><au>MUN, SOOHYOUN</au><au>SONG, HYUNJI</au><au>NAM, YOUNHEE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Polymer, organic layer composition, and method of forming patterns</title><date>2019-08-01</date><risdate>2019</risdate><abstract>The present invention provides a polymer comprising a structure unit represented by chemical formula 1 below and a structure unit represented by chemical formula 2 below, an organic layer composition comprising the polymer, and a method for forming patterns using the organic layer composition. 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | Polymer, organic layer composition, and method of forming patterns |
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