Polymer, organic layer composition, and method of forming patterns

The present invention provides a polymer comprising a structure unit represented by chemical formula 1 below and a structure unit represented by chemical formula 2 below, an organic layer composition comprising the polymer, and a method for forming patterns using the organic layer composition. In th...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	RATHWELL, DOMINEA, KWON, HYO YOUNG, JUNG, HYEONIL, HEO, YUMI, NAMGUNG, RAN, MUN, SOOHYOUN, SONG, HYUNJI, NAM, YOUNHEE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention provides a polymer comprising a structure unit represented by chemical formula 1 below and a structure unit represented by chemical formula 2 below, an organic layer composition comprising the polymer, and a method for forming patterns using the organic layer composition. In the chemical formula 1 and 2, A1 and A2 are each independently a divalent group comprising at least one substituted or unsubstituted benzene ring, A3 is a divalent group each containing a quaternary carbon and a ring, symbol * is a point of connection.