TWI654325B

Provided is an evaporation source device capable of fine temperature control of a crucible and of forming a thin film having a uniform film thickness distribution by optimizing the temperature distribution of the crucible in a shorter amount of time. A main heater (3) is provided, in the crucible (2...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KONDO, YOSHINARI, MISAWA, KEITA, YAMAZAKI, MASAHIRO, YAMADA, NAOTO, WATANABE, KAZUHIRO, MATSUMOTO, EIICHI, KOBAYASHI, YOSHIMASA, MAKI, SHUJI
Format:	Patent
Sprache:	chi
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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