TWI654325B

Provided is an evaporation source device capable of fine temperature control of a crucible and of forming a thin film having a uniform film thickness distribution by optimizing the temperature distribution of the crucible in a shorter amount of time. A main heater (3) is provided, in the crucible (2...

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Bibliographische Detailangaben
Hauptverfasser:	KONDO, YOSHINARI, MISAWA, KEITA, YAMAZAKI, MASAHIRO, YAMADA, NAOTO, WATANABE, KAZUHIRO, MATSUMOTO, EIICHI, KOBAYASHI, YOSHIMASA, MAKI, SHUJI
Format:	Patent
Sprache:	chi
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Provided is an evaporation source device capable of fine temperature control of a crucible and of forming a thin film having a uniform film thickness distribution by optimizing the temperature distribution of the crucible in a shorter amount of time. A main heater (3) is provided, in the crucible (2) in which an evaporation material (1) is accommodated, along the longitudinal direction of the crucible, and auxiliary heaters (4) are provided at least at both ends in the longitudinal direction of the crucible (2) having the main heater (3). The evaporation source device is configured so that it is possible to heat and control both ends in the longitudinal direction of the crucible (2) by using the main heater (3) and the auxiliary heaters (4).