Method of processing workpiece

A method of processing a workpiece is disclosed, where the ion chamber is first coated with the desired dopant species and another species. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant, is introduced to the chamber and ionized. Ions are then extract...

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Bibliographische Detailangaben
Hauptverfasser:	LEVAY, WILLIAM T, BATEMAN, NICHOLAS P. T, KOO, BON-WOONG, MILLER, TIMOTHY J, GRAFF, JOHN W, KURUNCZI, PETER F, BHOSLE, VIKRAM M, FRONTIERO, JOHN A, LEAVITT, CHRISTOPHER J
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method of processing a workpiece is disclosed, where the ion chamber is first coated with the desired dopant species and another species. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant, is introduced to the chamber and ionized. Ions are then extracted from the chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. The other species used during the conditioning process may be a Group 3, 4 or 5 element. The desired dopant species may be boron.