Method for cleaning semiconductor substrate and method for fabricating semiconductor device

The present invention relates to a method for cleaning a substrate such as a semiconductor substrate for the manufacture of an integrated circuit. The method includes cleaning a semiconductor substrate with a first mixture consisting of ozone and at least one of an acid and a base, followed by a sec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YEH, MING HSI, JANG, SYUN MING, CHOU, BO WEI, WU, SUNG HSUN, CHEN, CHAO CHENG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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