Treatment liquid supplying apparatus and controlling method of treatment liquid supplying apparatus

PROBLEM TO BE SOLVED: To provide a process liquid supply device which prevents liquid dripping when closing an on-off valve, and a control method therefor.SOLUTION: Before bringing an on-off valve 17 into a closed state, a process liquid flow passage 70 is narrowed down not only by a needle 62 of a...

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Bibliographische Detailangaben
1. Verfasser:	KASHIYAMA, MASAHITO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a process liquid supply device which prevents liquid dripping when closing an on-off valve, and a control method therefor.SOLUTION: Before bringing an on-off valve 17 into a closed state, a process liquid flow passage 70 is narrowed down not only by a needle 62 of a suck-back valve 19 but also by a diaphragm 46 of the on-off valve 17. Therefore, a pressure of a process liquid to be sent to the suck-back valve 19 can be suppressed and a pressure difference can be suppressed before and behind the suck-back valve 19. As a result, mixture of air into the process liquid can be suppressed. When bringing the on-off valve 17 into the closed state while picking up a moving speed of the diaphragm 46, a moving amount of the diaphragm 46 is reduced, the process liquid to be extruded with the movement of the diaphragm 46 is decreased, and the on-off valve 17 is closed.SELECTED DRAWING: Figure 6