TWI615672B

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a cured film having an excellent transparency and of avoiding, even when exposed and then developed by using an aqueous tetramethyl ammonium hydroxide solution, an excessive dissolution of the exposed portion...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SOMEYA, KAZUYA, KATANO, AKIRA, OHUCHI, YASUHIDE
Format: Patent
Sprache:chi
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a cured film having an excellent transparency and of avoiding, even when exposed and then developed by using an aqueous tetramethyl ammonium hydroxide solution, an excessive dissolution of the exposed portion of the radiation-sensitive resin composition; a method for forming a patterned resin film using the radiation-sensitive resin composition; an insulating film formed by using the radiation-sensitive resin composition; and a display device possessing the insulating film.SOLUTION: An alkali-soluble resin (A) consisting of a copolymer including (a1) units derived from an unsaturated carboxylic acid and a specified quantity of (a2) units derived from an epoxy group-free alicyclic skeleton-containing unsaturated compound, a photopolymerizable compound (B), and a photopolymerization initiator (C) including an oxime ester compound having a specified structure are mixed with a radiation-sensitive resin composition.