System for an extreme ultraviolet light source, method of aligning an irradiating amplified light beam generated from an extreme ultraviolet light system relative to a target material, and extreme ultraviolet light system

System for an extreme ultraviolet light source, method of aligning an irradiating amplified light beam generated from an extreme ultraviolet light system relative to a target material, and extreme ultraviolet light system

A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: FOMENKOV, IGOR V, FLEUROV, VLADIMIR B
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor.