TWI599271B

The invention provides a device for coating nano particles on substrate and its manufacturing method comprising: providing at least one material feeding stick in a plasma processing device; electrifying the plasma processing device and introducing a gas for cold plasma processing so that the plasma...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HUANG, WEN-KE, SHI, SHIN
Format: Patent
Sprache:chi
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Beschreibung
Zusammenfassung:The invention provides a device for coating nano particles on substrate and its manufacturing method comprising: providing at least one material feeding stick in a plasma processing device; electrifying the plasma processing device and introducing a gas for cold plasma processing so that the plasma generated inside the plasma processing device impacts the material feeding stick to release a plurality of nano particles; and, spraying the mixture containing plasma and the nano particles from an outlet of the plasma processing device onto a substrate. The mixture may perform the modification, film coating, sterilizing or toxicity measurement for the substrate, wherein the coating operation is not be restricted by the state property (i.e. solid, liquid, gas as three state) of the substrate and can be performed under the environment of normal temperature and normal pressure without restricting at vacuum environment and adapting associated facility required for vacuum environment.