Method for etching multi-layer epitaxial material and solar cell device

A single-step wet etch process is provided to isolate multijunction solar cells on semiconductor substrates, wherein the wet etch chemistry removes semiconductor materials nonselectively without a major difference in etch rate between different heteroepitaxial layers. The solar cells thus formed com...

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Hauptverfasser:	FIDANER, ONUR, WIEMER, MICHAEL W, LUCOW, EWELINA N, SABNIS, VIJIT A
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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creator	FIDANER, ONUR WIEMER, MICHAEL W LUCOW, EWELINA N SABNIS, VIJIT A
description	A single-step wet etch process is provided to isolate multijunction solar cells on semiconductor substrates, wherein the wet etch chemistry removes semiconductor materials nonselectively without a major difference in etch rate between different heteroepitaxial layers. The solar cells thus formed comprise multiple heterogeneous semiconductor layers epitaxially grown on the semiconductor substrate.
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title	Method for etching multi-layer epitaxial material and solar cell device
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