Method for etching multi-layer epitaxial material and solar cell device

A single-step wet etch process is provided to isolate multijunction solar cells on semiconductor substrates, wherein the wet etch chemistry removes semiconductor materials nonselectively without a major difference in etch rate between different heteroepitaxial layers. The solar cells thus formed com...

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Hauptverfasser: FIDANER, ONUR, WIEMER, MICHAEL W, LUCOW, EWELINA N, SABNIS, VIJIT A
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A single-step wet etch process is provided to isolate multijunction solar cells on semiconductor substrates, wherein the wet etch chemistry removes semiconductor materials nonselectively without a major difference in etch rate between different heteroepitaxial layers. The solar cells thus formed comprise multiple heterogeneous semiconductor layers epitaxially grown on the semiconductor substrate.