Photosensitive composition for light shielding and light shielding layer obtained therefrom

The present invention relates to a photosensitive resin composition for light shielding, and a light-shielding layer formed using the same. The photosensitive resin composition for light shielding contains (A) a siloxane resin, (B) a pigment, (C) a photopolymerization initiator, and (D) an organic s...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KIM, TAE-OON, LEE, KYUN-PHYO, CHOI, JUNG-SIK, KIM, HAK-JUN, AHN, JUNG-MIN, CHO, YONG-IL
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention relates to a photosensitive resin composition for light shielding, and a light-shielding layer formed using the same. The photosensitive resin composition for light shielding contains (A) a siloxane resin, (B) a pigment, (C) a photopolymerization initiator, and (D) an organic solvent, and optionally may further contain (E) a multi-functional monomer having an unsaturated bond. A coating film for a light shielding layer, formed of the photosensitive resin composition for light shielding, is characterized in that the coating film has excellent electrical characteristics, excellent adhesive strength with a substrate, and no deterioration in optical density, even after a high-temperature process at 300°C or higher.