Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

A monomer for a hardmask composition is represented by the following Chemical Formula 1,

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KIM, YOUNG-MIN, PARK, YOU-JUNG, MOON, JOON-YOUNG, SHIN, SEUNG-WOOK, LEE, CHUNG-HEON, KIM, GO-UN, YOON, YONG-WOON, SONG, HYUN-JI, KIM, YUN-JUN, PARK, YOOUL, KIM, HEA-JUNG, PARK, YU-SHIN, CHOI, YOO-JEONG, HONG, SEUNG-HEE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A monomer for a hardmask composition is represented by the following Chemical Formula 1,