Lithographic apparatus and a method of operating the apparatus

A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are tak...

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Bibliographische Detailangaben
Hauptverfasser:	VAN LIER, HENRICUS MARTINUS DOROTHEUS, WATSO, ROBERT DOUGLAS, VAN DE WINKEL, JIMMY MATHEUS WILHELMUS, DA PAZ SENA, JOAO PAULO, DE JONG, ANTHONIUS MARTINUS CORNELIS PETRUS, MERTENS, JEROEN JOHANNES SOPHIA MARIA, JANSEN, HANS, TANASA, GHEORGHE, VAN DOMMELEN, YOURI JOHANNES LAURENTIUS MARIA, JACOBS, JOHANNES HENRICUS WILHELMUS, STEIJAERT, PETER PAUL, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, VAN DER LEE, MAURICE MARTINUS JOHANNES
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.