Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet...

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Bibliographische Detailangaben
Hauptverfasser:	DIRECKS, DANIEL JOZEF MARIA, SIMONS, WILHELMUS FRANCISCUS JOHANNES, LEMPENS, HAN HENRICUS ALDEGONDA, VAN LIEROP, MATHIEUS ANNA KAREL, SCHOLTES, PAUL WILLIAM, BERKVENS, PAUL PETRUS JOANNES, SPRUYTENBURG, PATRICK JOHANNES WILHELMUS, DE METSENAERE, CHRISTOPHE, BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS, VAN DER HAM, RONALD, DE GRAAF, ROELOF FREDERIK, JANSSEN, FRANCISCUS JOHANNES JOSEPH, VERSTRAETE, JORIS JOHAN ANNE-MARIE, LIEBREGTS, PAULUS MARTINUS MARIA, MIRANDA, MARCIO ALEXANDRE CANO, STEFFENS, KOEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.