Vacuum processing chamber suitable for etching high aspect ratio features and components of same
A coating has a cylindrical body (914) comprising upper and lower edges, and a flange extending radially outwards from the upper edge. A recess (932) is formed in an outer surface of the body. A slit (938) is arranged in the recess and passes through the body, where the body is coated by yttrium or...
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| creator | ZHOU, XIAOPING SCANLAN, DECLAN PATERSON, ALEXANDER PAMARTHY, SHARMA DIETZ, JEFFREY WILLIAM HOLLAND, JOHN P GUTIERREZ, DAVID E ABOOAMERI, FARID KOOSAU, DENNIS M DAO, HUUTRI DINEV, JIVKO MCDONOUGH, KELLY A HE, ZHONGYI JIM DESHMUKH, SHASHANK CLARK, ROBERT S |
| description | A coating has a cylindrical body (914) comprising upper and lower edges, and a flange extending radially outwards from the upper edge. A recess (932) is formed in an outer surface of the body. A slit (938) is arranged in the recess and passes through the body, where the body is coated by yttrium or yttrium oxide. A lip (918) extends from an inner surface of the body in a radially inward manner, where the lip has an upper surface. |
| format | Patent |
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A recess (932) is formed in an outer surface of the body. A slit (938) is arranged in the recess and passes through the body, where the body is coated by yttrium or yttrium oxide. 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A recess (932) is formed in an outer surface of the body. A slit (938) is arranged in the recess and passes through the body, where the body is coated by yttrium or yttrium oxide. A lip (918) extends from an inner surface of the body in a radially inward manner, where the lip has an upper surface.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Vacuum processing chamber suitable for etching high aspect ratio features and components of same |
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