ELECTRICAL INTERCONNECT STRUCTURE AND METHOD

An electrical interconnect forming method. The electrical interconnect includes a first substrate comprising a first electrically conductive pad, a second substrate comprising a second electrically conductive pad, and an interconnect structure electrically and mechanically connecting the first elect...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NAH, JAE-WOONG, FURMAN, BRUCE K, SHIH, DA-YUAN, GRUBER, PETER A, BUCHWALTER, STEPHEN LESLIE
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:An electrical interconnect forming method. The electrical interconnect includes a first substrate comprising a first electrically conductive pad, a second substrate comprising a second electrically conductive pad, and an interconnect structure electrically and mechanically connecting the first electrically conductive pad to the second electrically conductive pad. The interconnect structure comprises a non-solder metallic core structure, a first solder structure, and a second solder structure. The first solder structure electrically and mechanically connects a first portion of the non-solder metallic core structure to the first electrically conductive pad. The second solder structure electrically and mechanically connects a second portion of the non-solder metallic core structure to the second electrically conductive pad.