Coating machine and fixing method of a substrate

A coating device capable of setting the attraction of adsorption substrates being able to restrain the working cycle of the coating device in long-term when does not generate uneven coating and a method of maintaining the substrate. The coating device comprises: a substrate maintaining device for generating attraction in attraction hole formed on surface of the worktable and adsorbing and maintaining the substrate on the surface of the worktable and a coating unit for moving relative to the substrate and ejecting the coating solution; the substrate maintaining device comprises a pressure adjusting part for adjusting the pressure attached to the substrate to adjust the attraction to the substrate; the pressure adjusting part can be adjusted into initial pressure and maintaining pressure; the initial pressure adsorbs the substrate just loaded on the surface of the worktable; the maintaining pressure maintains the state of the substrate maintaining in the surface of the worktable after the initial pressure adsor