Polyamic acid and polyimide film, method for fabricating the same, composition and utilization thereof

The purpose of the present invention is to provide a polyimide resin which exhibits higher heat resistance than that of a conventional polyimide resin by controlling the geometric configuration of the constituent units. Provided is a polyamic acid which comprises repeating units represented by gener...

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Bibliographische Detailangaben
Hauptverfasser: FUKUKAWA, KENICHI, SAKATA, YOSHIHIRO, YAMASHITA, WATARU, OKAZAKI, MASAKI, FUJIO, ICHIRO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The purpose of the present invention is to provide a polyimide resin which exhibits higher heat resistance than that of a conventional polyimide resin by controlling the geometric configuration of the constituent units. Provided is a polyamic acid which comprises repeating units represented by general formula (1), wherein the 1,4-bismethylenecyclohexane skeleton units consist of both trans- and cis-form units, and the contents of the trans- and cis-form units are 60 to 100% and 0 to 40% respectively (with the sum total of the trans- and cis-form units being 100%).