Lithographic apparatus and device manufacturing method

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirro...

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Bibliographische Detailangaben
Hauptverfasser:	SMITS, PETER, VERMEULEN, MARCUS MARTINUS PETRUS ADRIANUS, MEULENDIJKS, ANTONIUS ARNOLDUS, LOOPSTRA, ERIK ROELOF, COMPEN, RENE THEODORUS PETRUS, HOUBEN, MARTIJN, OTTENS, JOOST JEROEN, LEENAARS, RENE WILHELMUS ANTONIUS HUBERTUS, JEUNINK, ANDRE BERNARDUS, VAN ABEELEN, HENDRIKUS JOHANNES MARINUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.