TWI419206B
An atmosphere opening method of a processing chamber and a recording medium are provided to prevent the emission of poisonous gas such as HF in atmosphere opening of the processing chamber by causing fluoride to react with moisture completely. An atmosphere opening method of a processing chamber inc...
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| Format: | Patent |
| Sprache: | chi |
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| Zusammenfassung: | An atmosphere opening method of a processing chamber and a recording medium are provided to prevent the emission of poisonous gas such as HF in atmosphere opening of the processing chamber by causing fluoride to react with moisture completely. An atmosphere opening method of a processing chamber includes the steps of: introducing atmosphere in the processing chamber; waiting for some time for fluoride to react with moisture completely, and discharging HF; repeating the former step. |
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