TWI395761B
Disclosed is an alkali-developable resin composition containing a fluorine-containing copolymer (E) which is obtained by modifying a part or all of hydroxyl groups in a block copolymer (C) with a polybasic acid anhydride (D). The block copolymer (C) is composed of a segment A which is a fluorine-con...
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| creator | CHIBA, RYOTA TSUZUKI, MASAHIDE |
| description | Disclosed is an alkali-developable resin composition containing a fluorine-containing copolymer (E) which is obtained by modifying a part or all of hydroxyl groups in a block copolymer (C) with a polybasic acid anhydride (D). The block copolymer (C) is composed of a segment A which is a fluorine-containing segment obtained from one or more fluorine monomers (A) and a segment B which is a fluorine-free segment obtained from one or more fluorine-free monomers (B), and the hydroxyl groups are contained in the segment A and/or the segment B. Also disclosed is an alkali-developable photosensitive resin composition containing such an alkali-developable resin composition containing a fluorine-containing copolymer. This alkali-developable photosensitive resin composition is excellent in ink repellency, alkali developability, sensitivity, resolution, transparency, adhesion and alkali resistance, and enables to form a fine pattern precisely. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TWI395761BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TWI395761BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TWI395761BB3</originalsourceid><addsrcrecordid>eNrjZOAKCfc0tjQ1NzN04mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8QgNTsZEKAEADNwbjg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TWI395761B</title><source>esp@cenet</source><creator>CHIBA, RYOTA ; TSUZUKI, MASAHIDE</creator><creatorcontrib>CHIBA, RYOTA ; TSUZUKI, MASAHIDE</creatorcontrib><description>Disclosed is an alkali-developable resin composition containing a fluorine-containing copolymer (E) which is obtained by modifying a part or all of hydroxyl groups in a block copolymer (C) with a polybasic acid anhydride (D). The block copolymer (C) is composed of a segment A which is a fluorine-containing segment obtained from one or more fluorine monomers (A) and a segment B which is a fluorine-free segment obtained from one or more fluorine-free monomers (B), and the hydroxyl groups are contained in the segment A and/or the segment B. Also disclosed is an alkali-developable photosensitive resin composition containing such an alkali-developable resin composition containing a fluorine-containing copolymer. This alkali-developable photosensitive resin composition is excellent in ink repellency, alkali developability, sensitivity, resolution, transparency, adhesion and alkali resistance, and enables to form a fine pattern precisely.</description><language>chi</language><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ; ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; DYES ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PAINTS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS AS ADHESIVES</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130511&DB=EPODOC&CC=TW&NR=I395761B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130511&DB=EPODOC&CC=TW&NR=I395761B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHIBA, RYOTA</creatorcontrib><creatorcontrib>TSUZUKI, MASAHIDE</creatorcontrib><title>TWI395761B</title><description>Disclosed is an alkali-developable resin composition containing a fluorine-containing copolymer (E) which is obtained by modifying a part or all of hydroxyl groups in a block copolymer (C) with a polybasic acid anhydride (D). The block copolymer (C) is composed of a segment A which is a fluorine-containing segment obtained from one or more fluorine monomers (A) and a segment B which is a fluorine-free segment obtained from one or more fluorine-free monomers (B), and the hydroxyl groups are contained in the segment A and/or the segment B. Also disclosed is an alkali-developable photosensitive resin composition containing such an alkali-developable resin composition containing a fluorine-containing copolymer. This alkali-developable photosensitive resin composition is excellent in ink repellency, alkali developability, sensitivity, resolution, transparency, adhesion and alkali resistance, and enables to form a fine pattern precisely.</description><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</subject><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS AS ADHESIVES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOAKCfc0tjQ1NzN04mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8QgNTsZEKAEADNwbjg</recordid><startdate>20130511</startdate><enddate>20130511</enddate><creator>CHIBA, RYOTA</creator><creator>TSUZUKI, MASAHIDE</creator><scope>EVB</scope></search><sort><creationdate>20130511</creationdate><title>TWI395761B</title><author>CHIBA, RYOTA ; TSUZUKI, MASAHIDE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI395761BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi</language><creationdate>2013</creationdate><topic>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</topic><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS AS ADHESIVES</topic><toplevel>online_resources</toplevel><creatorcontrib>CHIBA, RYOTA</creatorcontrib><creatorcontrib>TSUZUKI, MASAHIDE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHIBA, RYOTA</au><au>TSUZUKI, MASAHIDE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TWI395761B</title><date>2013-05-11</date><risdate>2013</risdate><abstract>Disclosed is an alkali-developable resin composition containing a fluorine-containing copolymer (E) which is obtained by modifying a part or all of hydroxyl groups in a block copolymer (C) with a polybasic acid anhydride (D). The block copolymer (C) is composed of a segment A which is a fluorine-containing segment obtained from one or more fluorine monomers (A) and a segment B which is a fluorine-free segment obtained from one or more fluorine-free monomers (B), and the hydroxyl groups are contained in the segment A and/or the segment B. Also disclosed is an alkali-developable photosensitive resin composition containing such an alkali-developable resin composition containing a fluorine-containing copolymer. This alkali-developable photosensitive resin composition is excellent in ink repellency, alkali developability, sensitivity, resolution, transparency, adhesion and alkali resistance, and enables to form a fine pattern precisely.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DYES ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES |
| title | TWI395761B |
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