TWI395761B

Disclosed is an alkali-developable resin composition containing a fluorine-containing copolymer (E) which is obtained by modifying a part or all of hydroxyl groups in a block copolymer (C) with a polybasic acid anhydride (D). The block copolymer (C) is composed of a segment A which is a fluorine-con...

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Bibliographische Detailangaben
Hauptverfasser:	CHIBA, RYOTA, TSUZUKI, MASAHIDE
Format:	Patent
Sprache:	chi
Schlagworte:	ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DYES ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES
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Beschreibung
Zusammenfassung:	Disclosed is an alkali-developable resin composition containing a fluorine-containing copolymer (E) which is obtained by modifying a part or all of hydroxyl groups in a block copolymer (C) with a polybasic acid anhydride (D). The block copolymer (C) is composed of a segment A which is a fluorine-containing segment obtained from one or more fluorine monomers (A) and a segment B which is a fluorine-free segment obtained from one or more fluorine-free monomers (B), and the hydroxyl groups are contained in the segment A and/or the segment B. Also disclosed is an alkali-developable photosensitive resin composition containing such an alkali-developable resin composition containing a fluorine-containing copolymer. This alkali-developable photosensitive resin composition is excellent in ink repellency, alkali developability, sensitivity, resolution, transparency, adhesion and alkali resistance, and enables to form a fine pattern precisely.