Resist composition, method of formimg resist pattern, novel compound and method of producing the same, and acid generator

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Hauptverfasser:	KAWAUE, AKIYA, HIDESAKA, SHINICHI, NAKAMURA, TSUYOSHI, KUROSAWA, TSUYOSHI, MATSUZAWA, KENSUKE, SESHIMO, TAKEHIRO, HADA, HIDEO, MARUYAMA, NATSUKO, IWAI, TAKESHI, SHIMIZU, HIROAKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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